EUV Illumination
Excimer Laser Optics
DUV Projection Lens
EUV Illumination

Hyperion has recently been involved with an EUV illuminator design for a revolutionary microdischarge plasma light source technology from Starfire Industries.  This arrayed source has potential to dramatically improve the optical efficiency of future EUV illuminators.  The source and the optical design concepts have been well received by the semiconductor industry.

The optical design challenge is to multiplex the sources to form uniform reticle illumination while preserving the pupil mapping from illuminator to projection lens.  By reducing the mirror count found in many contemporary EUV illuminators, the efficiency of the EUV optics can be greatly improved.

EUV Illumination design for custom EUV optics
Illumination analysis and array source models
Reflective homogenizer optics